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VOL. 3, ISSUE 1 (2018)
Study of body bias on Dopingless SOI
Authors
Abhishek Mishra, Annu Choudhary, Dr. Bhuwan Gupta
Abstract
In this paper, we study the impact of body bias, gate length, and spacer length on various performance parameters of n-type dopingless Silicon on Insulator transistor (DL-SOI). On-off current ratio (Ion/Ioff) increases with increase in negative body bias voltage. Simulation study shows that subthreshold swing (SS), drain induced barrier lowering (DIBL) are also improved with negative body bias. A comparative study is also performed between junctionless SOI transistor (JL-SOI) and DL-SOI with respect to body bias voltage. Performance parameters such as SS, DIBL, Ion/Ioff are improved in both the devices with negative body bias voltage, but DL-SOI shows higher improvement in Ion/Ioff than JL-SOI with negative body bias voltage. DL-SOI also shows lower threshold voltage variation in comparison to JL-SOI device with body bias voltage.
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Pages:944-948
How to cite this article:
Abhishek Mishra, Annu Choudhary, Dr. Bhuwan Gupta "Study of body bias on Dopingless SOI". National Journal of Multidisciplinary Research and Development, Vol 3, Issue 1, 2018, Pages 944-948
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